Principles and Practice of Thin-Film Deposition: Fundamentals, Process Engineering, Industrial Applications PVD, CVD, ALD, Sputtering Technologies

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Descrizione (1)

Pagine: 388, Copertina rigida, Independently published

Specifiche del prodotto

Marchio Independently Published
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  • 9798186678281

Wiley

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Handbook of Chemical Vapor Deposition: PRINCIPLES, Technology AND Applications (CVD : TECHNOLOGY,...

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Plasma Surface Processing and Thin Film Engineering: Enhancing Material Performance Through Coating,...

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